Technic Announces the Release of TechniStrip® Micro D2

Non-hazardous Replacement for NMP-based Photoresist Strippers.

Cranston, RI, USA - With increased concerns and regulations of N-methylpyrrolidone (NMP) as a reprotoxin, Technic has developed a new photoresist stripper, free of NMP that achieves higher performance without an increase in cost. TechniStrip® Micro D2 is an environmentally friendly, non-hazardous solution of specially developed organic solvents with running costs similar to NMP-based strippers. 

TechniStrip® Micro D2 provides better dissolution and faster lift off in high volume production testing around the globe. TechniStrip® Micro D2 also provides greater metal and material compatibility, allowing it to be used on all stacks and particularly on sensitive materials such as III/V substrates.

TechniStrip® Micro D2 is currently in mass production around the world and is used in a variety of applications including the removal of negative and positive tone resist, rework, and as a cleaner for adhesives and glues.

Technic is a global supplier of advanced chemical solutions and controls for the semiconductor industry. The company manufactures a complete line of cleaners, photoresist strippers and metal etchants under the names TechniClean, TechniStrip^® , and TechniEtch. Technic also manufactures fabrication and packaging chemistry marketed under the Elevate^® brand name.

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