New High-Performance Water-Based Photoresist with Significant Ecological and Economic Advantages


Cranston, RI, USA - Technic has announced the release of TechniStrip® P1331, an environmentally friendly, high performance photoresist stripper formulated for use with negative and positive photoresist with thicknesses ranging from 1 – 150 microns.

TechniStrip® P1331 provides full dissolution of most photoresists without the use of harmful chemistries like NMP and Hydroxylamine. A water-based stripper, TechniStrip® P1331 is highly compatible with Cu, Al, and other metal substrates while offering an extended bath life compared to other Solvent/TMAH based strippers.

TechniStrip® P1331 is currently in mass production in facilities around the world in immersion, soak and spray, batch sprays, and SWT photoresist stripping tools. TechniStrip® P1331 has a wide range of applications and is ideal for use in backend applications like TSV, Cu pillar, bumping, and more.

Technic is a global supplier of advanced chemical solutions and controls for the semiconductor industry. The company manufactures a complete line of cleaners, photoresist strippers and metal etchants under the names TechniClean, TechniStrip® , and TechniEtch. Technic also manufactures fabrication and packaging chemistry marketed under the Elevate® brand name.

Downloadable Files

TechniStrip P1331 Press Release