New Highly-Selective and Versatile Post-Etch Residue Cleaner

Cranston, RI, USA - Technic has announced the release of TechniClean IK73, a post-etch residue cleaner with exceptional removal performance and selectivity to critical materials.

TechniClean IK73 is specially formulated to target the selective removal of highly-inert chemical residues created during the patterning of high-k dielectric metal oxides including hafnium, zirconium and tantalum oxides. TechniClean IK73 functions well at room temperature and is easily rinsed. The process is suitable in immersion, batch-spray, and single-wafer chemical applications.

TechniClean IK73 has been qualified and is in full-scale production at leading-edge semiconductor manufacturers around the globe. The ability to remove some of the toughest post-etch residues has made TechniClean IK73 an essential product for advanced semiconductor manufacturing processes.

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