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UVER 2

Alkali soluble UV curing etch resist, suitable for use with many alkaline and acidic etchants.

Characteristics:

Excellent surface finish free of bubbles, dewets and particulates.
High definition (no "ghost" in image after etching).
Simple UV drying.
Good etch resistance.
Easily removed in simple caustic solutions, such as NaOH (sodium hydroxide).

Availability: North America, Asia Pacific, Europe
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